Dr. Ariful Haque
https://www.scopus.com/authid/detail.uri?authorId=55523102989
Texas State University, United States
"Dr. Ariful Haque is currently working as a Technology Development Module and Integration Yield Engineer in the Logic Technology Development at INTEL Corporation, Hillsboro, Oregon, USA. He has extensive experience in fabricating and characterizing thin films and devices. As Moore's law continues to push the semiconductor research to its ultimate limit in terms of semiconductor process technology innovations and device architectures, some remarkable efforts from the aspect of research and developments in the semiconductor process flow and design are needed to meet the expectation of introducing new generation of chips (integrated circuits) and computationally more powerful devices. Ariful works on the state-of-the-art semiconductor process technologies to match the aspired pace and progress in the field. He uses various thin film deposition techniques, such as PVD, CVD, and plasma assisted deposition techniques to develop innovations in the interconnects and memory devices.
Ariful pursued his PhD on “Fabrication of Diamond and Q-carbon by Ultrafast Nanosecond Pulsed Laser Processing and Chemical Vapor Deposition for Electron Field Emission and Electrocatalysis Applications” from North Carolina State University, Raleigh, USA. He received bachelor’s degree in Electrical and Electronic Engineering (EEE) from Bangladesh University of Engineering & Technology (BUET) in 2012. After completing his bachelor’s degree, he briefly worked as a lecturer at Dhaka International University and Primeasia University in Bangladesh for approximately one year. He completed the MS in Materials Science from Missouri State University (MSU) in 2015. For the Ph.D., he joined the National Science Foundation Center for Advanced Materials and Smart Structures at North Carolina State University as a research assistant to investigate the fabrication, characterization, and optimization of carbon and III-nitride based semiconductors and devices. Here, he developed an advanced field emission measurement system to study the Q-carbon field emission devices, and a fabrication process of novel conductive tubular diamond-CNT structures with superior electrochemical performance. He completed the Ph.D. degree with a dual major in Materials Science & Engineering (MSE) and Electrical Engineering (EE) in February 2020. In parallel with the Ph.D. study, he has also completed the Master of Nanoengineering degree (his second masters) from NCSU in 2019 with a concentration in nanoelectronics and nanophotonics.
Dr. Haque’s research interests are diverse and cover the development and application of novel processing paradigms and the physics, chemistry & device applications of functional materials and semiconductors. He has expertise in thin film fabrication and characterizations, semiconductor doping, electrical field emission, nano-materials, graphene, graphene oxide, heterostructure of CNT and diamond, laser-solid interaction, electrical and magnetic transport properties, photovoltaics, energy, thin film defects, quantum computing & NV center, and so on. He has published over 30 articles in highly reputed journals and IEEE transactions, 6 proceeding/conference papers, and given 1 invited talk at MO State University and 12 conference presentations at reputed international conferences in his field. Ariful also serves as an associate editor in 3 peer reviewed journals, and as an ad hoc reviewer in more than 25 peer reviewed journals and IEEE transactions in the field. Currently he is serving as a guest editor in Nanomaterials and also editing a book entitled ‘Electronic and Optoelectronic Applications of Nanostructure and Thin-films of Carbon’. "